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Optimized sub-40 nm planar patterning process for a La0.7Sr0.3MnO3 magnetic memory

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https://hal-normandie-univ.archives-ouvertes.fr/hal-03544992
Contributor : Wilfrid Prellier Connect in order to contact the contributor
Submitted on : Thursday, January 27, 2022 - 9:08:47 AM
Last modification on : Saturday, June 25, 2022 - 9:57:29 AM

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Wilfrid Prellier, Nguyen Hoa Hong, Antoine Ruyter, Joe Sakai, Awatef Hassini, et al.. Optimized sub-40 nm planar patterning process for a La0.7Sr0.3MnO3 magnetic memory. Journal of Electroanalytical Chemistry, Elsevier 2005, 584 (1), pp.34-37. ⟨10.1016/j.jelechem.2004.02.021⟩. ⟨hal-03544992⟩

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