Raman Study of the Comparative Effects of Conventional and Microwave Annealing on MgTiO 3 Thin Films Sputtered on Si Substrate - Archive ouverte HAL Access content directly
Journal Articles physica status solidi (a) Year : 2022

Raman Study of the Comparative Effects of Conventional and Microwave Annealing on MgTiO 3 Thin Films Sputtered on Si Substrate

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Engineering Sciences [physics]

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https://hal-normandie-univ.archives-ouvertes.fr/hal-03667311

Submitted on : Friday, May 13, 2022-12:05:13 PM

Last modification on : Friday, March 24, 2023-2:53:26 PM

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hal-03667311 , version 1 (13-05-2022)

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Raphaël Strenaer, Yannick Guhel, Walid Gharbi, Rodolphe Macaigne, Sylvain Marinel, et al.. Raman Study of the Comparative Effects of Conventional and Microwave Annealing on MgTiO 3 Thin Films Sputtered on Si Substrate. physica status solidi (a), 2022, pp.2100640. ⟨10.1002/pssa.202100640⟩. ⟨hal-03667311⟩

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