Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates

Wilfrid Prellier; Nguyen Hoa Hong; Joe Sakai; Awatef Hassini

doi:10.1063/1.1619227

Journal Articles Applied Physics Letters Year : 2003

Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates

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Wilfrid Prellier

Function : Author
PersonId : 10988
IdHAL : wilfrid-prellier
ORCID : 0000-0002-1492-2837
IdRef : 11412423X

Laboratoire de cristallographie et sciences des matériaux

CV

Nguyen Hoa Hong

Function : Author

Joe Sakai

Function : Author
PersonId : 770836
ORCID : 0000-0001-7688-0655

Laboratoire d'Electrodynamique des Matériaux Avancés

Awatef Hassini

Function : Author

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Physics [physics] Chemical Sciences Chemical Sciences Material chemistry

Wilfrid Prellier : Connect in order to contact the contributor

https://hal-normandie-univ.archives-ouvertes.fr/hal-03544342

Submitted on : Wednesday, January 26, 2022-3:31:51 PM

Last modification on : Friday, March 24, 2023-2:53:25 PM

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hal-03544342 , version 1 (26-01-2022)

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HAL Id : hal-03544342 , version 1
DOI : 10.1063/1.1619227

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Wilfrid Prellier, Nguyen Hoa Hong, Joe Sakai, Awatef Hassini. Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates. Applied Physics Letters, 2003, 83 (15), pp.3129-3131. ⟨10.1063/1.1619227⟩. ⟨hal-03544342⟩

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Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates

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