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Journal articles
High permittivity SrHf0.5Ti0.5O3 films grown by pulsed laser deposition
L. Yan
1
M. Suchomel
2, 1
C. Grygiel
1
H. Niu
1
S. Mcmitchell
1
J. Bacsa
1
J. Clark
1
M. Werner
1
P. Chalker
1
M. Rosseinsky
1
L. Yan 1
Author
M. Suchomel 2, 1
Author
C. Grygiel 1
Author IdHAL : grygiel-clara ResearcherId : http://www.researcherid.com/rid/P-2777-2014 ORCID : https://orcid.org/0000-0002-4915-1016
H. Niu 1
Author
P. Chalker 1
Author
M. Rosseinsky 1
Author
1
University of Liverpool (Liverpool L69 3BX, United Kingdom
- United Kingdom)
2
APS - Advanced Photon Source [ANL] (Argonne National Laboratory Building 401 9700 S. Cass Avenue Argonne, IL 60439 - United States)
- ANL - Argonne National Laboratory [Lemont] (9700 S Cass Ave B109, Lemont, IL, 60439 - United States)
- University of Chicago (Edward H. Levi Hall 5801 South Ellis Avenue Chicago, Illinois 60637 - United States)
- US Department of Energy (France)
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Journal articles
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Complete list of metadatas
https://hal-normandie-univ.archives-ouvertes.fr/hal-02887905
Contributor : Clara Grygiel <>
Submitted on : Thursday, July 2, 2020 - 3:43:03 PM
Last modification on : Thursday, July 2, 2020 - 3:43:04 PM
Contributor : Clara Grygiel <>
Submitted on : Thursday, July 2, 2020 - 3:43:03 PM
Last modification on : Thursday, July 2, 2020 - 3:43:04 PM
Identifiers
- HAL Id : hal-02887905, version 1
- DOI : 10.1063/1.3151815
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Citation
L. Yan, M. Suchomel, C. Grygiel, H. Niu, S. Mcmitchell, et al.. High permittivity SrHf0.5Ti0.5O3 films grown by pulsed laser deposition. Applied Physics Letters, American Institute of Physics, 2009, 94 (23), pp.232903. ⟨10.1063/1.3151815⟩. ⟨hal-02887905⟩
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