High permittivity SrHf0.5Ti0.5O3 films grown by pulsed laser deposition

L. Yan (1) , M. Suchomel (2, 1) , C. Grygiel (1) , H. Niu (1) , S. Mcmitchell (1) , J. Bacsa (1) , J. Clark (1) , M. Werner (1) , P. Chalker (1) , M. Rosseinsky (1)

1 University of Liverpool
2 APS - Advanced Photon Source [ANL]

Domains: Physics [physics]; Condensed Matter [cond-mat]; Physics [physics]; Condensed Matter [cond-mat]; Materials Science [cond-mat.mtrl-sci]; Physics [physics]; High Energy Physics - Experiment [hep-ex]; Chemical Sciences; Cristallography; Chemical Sciences; Inorganic chemistry; Chemical Sciences; Material chemistry; Physics [physics]; Condensed Matter [cond-mat]; Strongly Correlated Electrons [cond-mat.str-el]; Engineering Sciences [physics]; Materials

L. Yan, M. Suchomel, C. Grygiel, H. Niu, S. Mcmitchell, et al.. High permittivity SrHf0.5Ti0.5O3 films grown by pulsed laser deposition. Applied Physics Letters, 2009, 94 (23), pp.232903. ⟨10.1063/1.3151815⟩. ⟨hal-02887905⟩