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SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition

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https://hal-normandie-univ.archives-ouvertes.fr/hal-02887893
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Submitted on : Thursday, July 2, 2020 - 3:39:42 PM
Last modification on : Thursday, July 2, 2020 - 3:39:43 PM

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L. Yan, Z. Xu, C. Grygiel, S. Mcmitchell, M. Suchomel, et al.. SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition. Applied physics. A, Materials science & processing, Springer Verlag, 2011, 104 (1), pp.447-451. ⟨10.1007/s00339-011-6257-8⟩. ⟨hal-02887893⟩

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