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Skin protection : the role of the residue remaining after product application

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Chemical Sciences Analytical chemistry Chemical Sciences Polymers Chemical Sciences Material chemistry Chemical Sciences Chemical Sciences Other

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https://hal-normandie-univ.archives-ouvertes.fr/hal-02565395

Submitted on : Wednesday, May 6, 2020-2:12:23 PM

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hal-02565395 , version 1 (06-05-2020)

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  • HAL Id : hal-02565395 , version 1

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Elodie Faucheux, Michel Grisel, Géraldine Savary, Celine Picard. Skin protection : the role of the residue remaining after product application. Journées Jean-Paul Marty 2019, Dec 2019, Paris, France. ⟨hal-02565395⟩

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COMUE-NORMANDIE UNILEHAVRE URCOM LABOS-XL-CHEM
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