Skin protection : the role of the residue remaining after product application - Archive ouverte HAL Access content directly
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hal-02565395 , version 1 (06-05-2020)

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  • HAL Id : hal-02565395 , version 1

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Elodie Faucheux, Michel Grisel, Géraldine Savary, Celine Picard. Skin protection : the role of the residue remaining after product application. Journées Jean-Paul Marty 2019, Dec 2019, Paris, France. ⟨hal-02565395⟩
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