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Characterization of p-type Doping in Silicon Nanocrystals Embedded in SiO 2

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https://hal-normandie-univ.archives-ouvertes.fr/hal-02294165
Contributor : Etienne Talbot <>
Submitted on : Monday, September 23, 2019 - 11:20:10 AM
Last modification on : Tuesday, October 22, 2019 - 10:40:10 AM

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R. Demoulin, M. Roussel, S. Duguay, D. Muller, D. Mathiot, et al.. Characterization of p-type Doping in Silicon Nanocrystals Embedded in SiO 2. Microscopy & Microanalysis 2019, Aug 2019, Portland, United States. pp.2540-2541, ⟨10.1017/S1431927619013436⟩. ⟨hal-02294165⟩

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