Three-dimensional atomic-scale imaging of boron clusters in implanted silicon

Abstract : The implantation profile of boron in silicon annealed at 600 °C for 1 h as given by laser-assisted wide-angle atom probe was found to be in good agreement with secondary ion mass spectrometry data. Numerous boron clusters in the form of tiny platelets (3-6 nm diameter, 2 nm thick) were identified and interpreted as boron interstitial clusters (BICs). These BICs contained on average 7 at.% B with a core level that reaches 10 at.%. © 2008 Acta Materialia Inc.
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https://hal-normandie-univ.archives-ouvertes.fr/hal-01953258
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Soumis le : mercredi 12 décembre 2018 - 17:18:48
Dernière modification le : jeudi 16 mai 2019 - 13:18:03

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O. Cojocaru-Mirédin, Emmanuel Cadel, F. Vurpillot, D. Mangelinck, D. Blavette. Three-dimensional atomic-scale imaging of boron clusters in implanted silicon. Scripta Materialia, 2009, 60 (5), pp.285-288. ⟨10.1016/j.scriptamat.2008.10.008⟩. ⟨hal-01953258⟩

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